Solvay Chemicals Product list

Electronic Chemicals

Solvay Fluor offers a range of chemicals for high performance etching in electronic devices manufacturing. Our liquids (HF and Ammonium Fluoride solutions) complies with the strongest needs for isotropic wet etching. Sifren®46, developed with Applied Material, offers the highest performances both in terms of selectivity's and aspect ratios for the most critical dielectric etching processes in nodes below the 0,25µm. Sifren®46 gas already been successfully tested for 65nm nodes.  Carbonyl difluoride (COF2 ) now available in sample quantities.

	Cleaning	Cleaning Processes
	CMP	Chemical Mechanical Planerazation Polishing
	Etch Gas	Etch Gas
	Silicon purifying	Silicon purifying
	Wafer production	Wafer production
	Wet Etching	Wet Etching

List of products

		Cleaning

Ammonium Fluoride, 40 %, 10 ppb Grade (C)

Ammonium Fluoride, 40 %, 10 ppb Grade (C)

	Carbonyl difluoride COF2	Carbonyl difluoride COF2 now available in sample quantities contact: marcello.riva@solvay.com

	Elemental Fluorine F2 (C)	Elemental Fluor (F2) is used to clean CVD tools from silicon deposition within the chamber, which was caused by the CVD process.

	Hydrofluoric Acid, 49 %, 1 ppb Grade (C)	Hydrofluoric Acid, 49 %, 1 ppb Grade (C)

	Hydrofluoric Acid, 49%, 10 ppb Grade (C)	Hydrofluoric Acid, 49%, 10 ppb Grade (C)

	Sulphur Hexafluoride SF6 (C)electronic grade 5.0	Sulphur Hexafluoride (SF6) is a non-toxic, inert, insulating and cooling gas of high dielectric strength and thermal stability. It is used for electrical engeneering and foundry practice.

		CMP

Ammonium Fluoride, 40 %, 10 ppb Grade (CMP)

Ammonium Fluoride, 40 %, 10 ppb Grade (CMP)

	Hydrofluoric Acid, 49 %, 1 ppb Grade (CMP)	Hydrofluoric Acid, 49 %, 1 ppb Grade (CMP)

	Hydrofluoric Acid, 49%, 10 ppb Grade (CMP)	Hydrofluoric Acid, 49%, 10 ppb Grade (CMP)

		Etch Gas

Sifren® 46 (E)

Sifren® 46 (C4F6 or Hexafluorobutadiene) is a fluoro compound with two double bonds in the molecule;produced by Solvay Fluor

		Silicon purifying

Ammonium Fluoride, 40 %, 10 ppb Grade (S)

Ammonium Fluoride, 40 %, 10 ppb Grade (S)

	Hydrofluoric Acid, 49 %, 1 ppb Grade (S)	Hydrofluoric Acid, 49 %, 1 ppb Grade (S)

	Hydrofluoric Acid, 49%, 10 ppb Grade (S)	Hydrofluoric Acid, 49%, 10 ppb Grade (S)

		Wafer production

Ammonium Fluoride, 40 %, 10 ppb Grade (WAF)

Ammonium Fluoride, 40 %, 10 ppb Grade (WAF)

	Hydrofluoric Acid, 49%, 1 ppb Grade (WAF)	Hydrofluoric Acid, 49%, 1 ppb Grade (WAF)

	Hydrofluoric Acid, 49%, 10 ppb Grade (WAF)	Hydrofluoric Acid, 49%, 10 ppb Grade (WAF)

		Wet Etching

Ammonium Fluoride, 40 %, 10 ppb Grade (W)

Ammonium Fluoride, 40 %, 10 ppb Grade (W)

	Hydrofluoric Acid, 49 %, 1 ppb Grade (W)	Hydrofluoric Acid, 49 %, 1 ppb Grade (W)

	Hydrofluoric Acid, 49%, 10 ppb Grade (W)	Hydrofluoric Acid, 49%, 10 ppb Grade (W)