Elemental Fluorine (F2) is used to clean CVD tools from deposition within the chamber, which was caused by the CVD process.
F2 high purity gas is used as a more efficient cleaning gas compared to NF3. Furthermore the GWP (Global Warming Potential) is zero compared to NF3 17900.
FLUORINE
Fluorine
Substance
F2
98 - 99 %
<= 0.5 %
gas
colourless
pungent
-220 °C
-188 °C
./.
